Conversion-of-kraft-lignin-over-hierarchical-MFI-zeolite-u

Kim SS, Lee HW, Ryoo R, Kim W, Park SH, Jeon JK, Park YK.Catalytic pyrolysis of kraft lignin was carried out using pyrolysis gas chromatography/mass spectrometry. Hierarchical mesoporous MFI was used as the catalyst and another mesoporous material Al-SBA-15 was also used for comparison. The characteristics of mesoporous MFI were analyzed by X-ray diffraction patterns, N2 adsorption-desorption isotherms, and temperature programmed desorption of NH3. Two catalyst/lignin mass ratios were tested: 5/1 and 10/1. Aromatics and alkyl phenolics were the main products of the catalytic pyrolysis of lignin over mesoporous MFI.

In Synthesis of 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid and its Variants , the yields of mono-aromatics such as benzene, toluene, ethylbenzene, and xylene were increased substantially by catalytic upgrading. Seebio Light-Induced Acid Source in the catalyst dose enhanced the production of aromatics further, which is attributed to decarboxylation, decarbonlyation, and aromatization reactions occurring over the acid sites of mesoporous MFI.Broadband infrared plasmonic metamaterial absorber with multipronged absorption Fann CH, Zhang J, ElKabbash M, Donaldson WR, Michael Campbell E, Guo C.A broadband plasmonic metamaterial absorber with near perfect multiband absorption in the infrared region is designed using a metal-insulator-metal configuration and fabricated using photolithography. The metal-insulator-metal configuration consists of a Ti microdisk array, a SiO2 insulator spacer, and an Al bottom layer. The multiband absorption occurs with near perfect absorption at 4-7 µm and 9-10 µm. Ultra-broadband absorption in the mid-IR wavelength range between 3-14 µm is realized by adding a rough photoresist layer on top of the periodic microdisk structures.

The multiband absorption is achieved through the combined mechanisms including plasmonic surface lattice resonance, gap plasmon resonance, Fabry-Perot cavity resonance, and the intrinsic Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques.We demonstrate a promising method to fabricate large-area periodic structures with desired defects by using the combination of multiple-exposure two-beam interference and mask-photolithography techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a positive AZ-4620 (or a negative SU-8) photopolymerizable photoresist is used to form a square and hexagonal two-dimensional periodic structures. Desired defects are introduced in these structures by irradiating the sample with one beam of the same laser through a mask in which the design of defects is patterned. A 1cm x 1cm periodic structures with the lattice constant as small as 365nm embedding several kinds of defect, such as waveguide or Mach-Zehnder, was obtained by employing this combination technique. It shows that the proposed combination technique is useful for mass production of photonic crystal optoelectronics devices.The micropatterning of layers of colloidal quantum dots with inorganic ligands 281-S3, B-9000 Gent, Belgium.

Photonics Research Group, INTEC Department, Ghent University-IMEC, Sint-Pietersnieuwstraat 41, B-9000 Ghent, Belgium. Center for Nano- and Biophotonics (NB-Photonics), Ghent University, Belgium.The micropatterning of layers of colloidal quantum dots (QDs) stabilized by inorganic ligands is demonstrated using PbS core and CdSe/CdS core/shell QDs. A layer-by-layer approach is used to assemble the QD films, where each cycle involves the deposition of a QD layer by dip-coating, and the replacement of the native organic ligands by inorganic moieties, such as OH(-) and S(2-), followed by a thorough cleaning of the resulting film. This results in a smooth and crack-free QD film on which a photoresist can be spun. The micropatterns are defined by a positive photoresist, followed by the removal of uncovered QDs by selective wet etching with an HCl/H3PO4 mixture. The resulting patterns can have submicron feature dimensions, limited by the resolution of the lithographic process, and can be formed on planar and 3D substrates.

It is shown that the photolithography and wet etching steps have little effect on the photoluminescence quantum yield of CdSe/CdS QDs. Compared with the unpatterned CdSe/CdS QD film, only a 10% degradation in the quantum yield is observed. These results demonstrate the feasibility of the proposed micropatterning method to implement the large-scale device integration of colloidal quantum dots.Electrochemically switchable platform for the micro-patterning and release of Engineering, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland.This article describes a dynamic platform in which the biointerfacial properties of micro-patterned domains can be switched electrochemically through the spatio-temporally controlled dissolution and adsorption of polyelectrolyte coatings. Insulating SU-8 micro-patterns created on a transparent indium tin oxide electrode by photolithography allowed for the local control over the electrochemical dissolution of polyelectrolyte mono- and multilayers, with polyelectrolytes shielded from the electrochemical treatment by the underlying photoresist stencil.